接触型局域SP光刻直写头的悬持结构设计及仿真分析
发布时间：2019-05-21 15:14
【摘要】：光刻技术在半导体工业中扮演着重要的角色,但衍射极限的存在限制了传统光学光刻在光刻分辨率上的进一步提高。由近场光学发展而来的近场光刻为突破衍射极限提供了新的思路,但光通率不高导致其光刻质量不佳。基于表面等离子体激元的近场光刻具有透射增强效应,使得光刻的分辨率和成像质量得到显著提高。等离子体直写光刻作为表面等离子体光刻技术的一种,光刻时无需掩模,能够实现任意图形的刻写,且光刻系统简单,成本较低,是一种理想的纳米光刻技术。扫描探针光刻作为一种重要的直写光刻方式,常采用悬臂梁探针结构。但悬臂梁受力容易弯曲变形,造成探针的位置精度误差。本文设计了一种具有双固支弹性臂的圆形弹簧作为扫描探针的悬持结构,提高光刻时探针的位置精度。弹性臂设计为圆弧形,弹性臂数为四个。通过调节弹性臂的有效臂长、宽度和厚度,实现较合理的弹簧刚度。通过理论分析了悬臂梁探针结构在接触模式和扫描模式下的探针位置精度,并利用有限元分析软件对两种探针悬持结构在两种工作模式下的位置精度进行了仿真对比。在接触模式下,悬臂梁探针产生水平位移,而圆形弹簧探针不会产生水平位移,位置精度得到较大提高;在扫描模式下,悬臂梁探针结构沿着不同方向扫描时,探针产生不同的水平位移;圆形弹簧探针结构的探针水平位移不随扫描方向的变化而变化,位置精度得到提高。对圆形弹簧应用于接触型局域表面等离子体直写光刻进行了动态仿真,通过优化结构参数,仿真结果达到预期效果。光刻时,圆形弹簧变形产生的弹性力能够保证探针与光刻胶的稳定接触;在接触模式下,圆形弹簧保持探针上升姿态垂直,不会发生偏转;在扫描模式下,圆形弹簧保持探针偏角角度恒定不变,探针刻写姿态稳定;在相同的位移载荷和扫描速度下,沿不同方向扫描时圆形弹簧使探针具有相同的绕xy平面的偏转角度。利用圆形弹簧的自适应性,在不超过探针允许倾斜角度的最大位移载荷下,能够调整1.5′的相对倾斜角度,并且在倾斜的光刻胶表面光刻时,圆形弹簧保证探针适应光刻胶表面的位置变化。完成接触型局域表面等离子体直写光刻系统的实验平台设计,并对关键部件进行选型和采购,确定扫描过程中探针刻写姿态的检测方案。
[Abstract]:The lithography technology plays an important role in the semiconductor industry, but the existence of the diffraction limit limits the further improvement of the conventional optical lithography in the photoetching resolution. The near-field lithography, which is developed from near-field optics, provides a new way to break the diffraction limit, but the light-pass rate is not high, resulting in poor lithographic quality. The near-field lithography based on surface plasmons has a transmission-enhancing effect, so that the resolution of the photolithography and the imaging quality are significantly improved. The plasma direct-writing lithography is used as one of the surface plasma photoetching technology, and can realize the writing of any pattern without a mask during the photoetching, and the photoetching system is simple and the cost is low, and is an ideal nano-photoetching technology. Scanning probe lithography, as an important direct-write lithographic method, is often used as a cantilever beam probe structure. But the force of the cantilever beam is easy to be bent and deformed, and the position precision error of the probe is caused. In this paper, a circular spring with two elastic arms is designed as the suspension structure of the scanning probe, and the position accuracy of the probe is improved. The elastic arm is designed in a circular arc shape, and the number of the elastic arms is four. By adjusting the effective arm length, width and thickness of the elastic arm, the reasonable spring rate is realized. The probe position accuracy of the cantilever beam probe structure under the contact mode and the scanning mode is analyzed by the theory, and the position accuracy of the two kinds of probe suspension structures under two working modes is simulated by using the finite element analysis software. in the contact mode, the cantilever beam probe generates a horizontal displacement, and the circular spring probe does not generate a horizontal displacement, and the position accuracy is greatly improved; in the scanning mode, when the cantilever beam probe structure is scanned in different directions, the probe generates different horizontal displacements; The probe horizontal displacement of the circular spring probe structure does not change with the change of the scanning direction, and the position accuracy is improved. The dynamic simulation of the circular spring applied to the contact type local surface plasma direct-write lithography is carried out, and the expected effect is achieved by the structure parameters. in the photoetching process, the elastic force generated by the deformation of the circular spring can ensure the stable contact of the probe and the photoresist; in the contact mode, the circular spring keeps the probe rising posture to be vertical and does not deflect; in the scanning mode, the circular spring keeps the angle of the probe angle of the probe constant, The probe has a stable writing posture; at the same displacement load and scanning speed, the circular spring makes the probe have the same deflection angle about the xy-plane at the time of scanning in different directions. With the self-adaptability of the circular spring, the relative inclination angle of 1.5% can be adjusted without exceeding the maximum displacement load of the probe allowing the inclination angle, and when the inclined photoresist surface is photoetching, the circular spring ensures that the probe is adapted to the position change of the surface of the photoresist. The design of the experimental platform of the contact type local surface plasma direct writing lithography system is completed, and the key parts are selected and purchased, and the detection scheme of the probe writing posture in the scanning process is determined.
【学位授予单位】：电子科技大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7
，
本文编号：2482186
[Abstract]:The lithography technology plays an important role in the semiconductor industry, but the existence of the diffraction limit limits the further improvement of the conventional optical lithography in the photoetching resolution. The near-field lithography, which is developed from near-field optics, provides a new way to break the diffraction limit, but the light-pass rate is not high, resulting in poor lithographic quality. The near-field lithography based on surface plasmons has a transmission-enhancing effect, so that the resolution of the photolithography and the imaging quality are significantly improved. The plasma direct-writing lithography is used as one of the surface plasma photoetching technology, and can realize the writing of any pattern without a mask during the photoetching, and the photoetching system is simple and the cost is low, and is an ideal nano-photoetching technology. Scanning probe lithography, as an important direct-write lithographic method, is often used as a cantilever beam probe structure. But the force of the cantilever beam is easy to be bent and deformed, and the position precision error of the probe is caused. In this paper, a circular spring with two elastic arms is designed as the suspension structure of the scanning probe, and the position accuracy of the probe is improved. The elastic arm is designed in a circular arc shape, and the number of the elastic arms is four. By adjusting the effective arm length, width and thickness of the elastic arm, the reasonable spring rate is realized. The probe position accuracy of the cantilever beam probe structure under the contact mode and the scanning mode is analyzed by the theory, and the position accuracy of the two kinds of probe suspension structures under two working modes is simulated by using the finite element analysis software. in the contact mode, the cantilever beam probe generates a horizontal displacement, and the circular spring probe does not generate a horizontal displacement, and the position accuracy is greatly improved; in the scanning mode, when the cantilever beam probe structure is scanned in different directions, the probe generates different horizontal displacements; The probe horizontal displacement of the circular spring probe structure does not change with the change of the scanning direction, and the position accuracy is improved. The dynamic simulation of the circular spring applied to the contact type local surface plasma direct-write lithography is carried out, and the expected effect is achieved by the structure parameters. in the photoetching process, the elastic force generated by the deformation of the circular spring can ensure the stable contact of the probe and the photoresist; in the contact mode, the circular spring keeps the probe rising posture to be vertical and does not deflect; in the scanning mode, the circular spring keeps the angle of the probe angle of the probe constant, The probe has a stable writing posture; at the same displacement load and scanning speed, the circular spring makes the probe have the same deflection angle about the xy-plane at the time of scanning in different directions. With the self-adaptability of the circular spring, the relative inclination angle of 1.5% can be adjusted without exceeding the maximum displacement load of the probe allowing the inclination angle, and when the inclined photoresist surface is photoetching, the circular spring ensures that the probe is adapted to the position change of the surface of the photoresist. The design of the experimental platform of the contact type local surface plasma direct writing lithography system is completed, and the key parts are selected and purchased, and the detection scheme of the probe writing posture in the scanning process is determined.
【学位授予单位】：电子科技大学
【学位级别】：硕士
【学位授予年份】：2015
【分类号】：TN305.7
，
本文编号：2482186
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